Reliability aspects of ferroelectric TiN/Hf 0.5 Zr 0.5 O 2 /Ge capacitors grown by plasma assisted atomic oxygen deposition

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Authors: C. Zacharaki, P. Tsipas, S. Chaitoglou, L. Bégon-Lours, M. Halter, A. Dimoulas

Journal title: Applied Physics Letters

Journal number: 117/21

Journal publisher: American Institute of Physics

Published year: 2020

Published pages: 212905

DOI identifier: 10.1063/5.0029657

ISSN: 0003-6951