Radiation hard pixel sensors using high-resistive wafers in a 150 nm CMOS processing line

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: D.-L. Pohl, T. Hemperek, I. Caicedo, L. Gonella, F. Hügging, J. Janssen, H. Krüger, A. Macchiolo, N. Owtscharenko, L. Vigani, N. Wermes

Journal title: Journal of Instrumentation

Journal number: 12/06

Journal publisher: Institute of Physics

Published year: 2017

Published pages: P06020-P06020

DOI identifier: 10.1088/1748-0221/12/06/P06020

ISSN: 1748-0221