Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography

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Authors: Markus Rohdenburg, Neha Thakur, René Cartaya, Sonia Castellanos and Petra Swiderek

Journal title: Physical Chemistry Chemical Physics

Journal number: 23

Journal publisher: Royal Chemical Society

Published year: 2021

Published pages: 16646-16657

DOI identifier: 10.1039/d1cp02334a

ISSN: 1463-9084