Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography

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Authors: Ashish Rathore, Maicol Cipriani, Ching-Chung Huang, Lionel Amiaud, Céline Dablemont, Anne Lafosse, Oddur Ingólfsson, Danilo De Simone, Stefan De Gendt

Journal title: Physical Chemistry Chemical Physics

Journal number: 23/15

Journal publisher: Royal Society of Chemistry

Published year: 2021

Published pages: 9228-9234

DOI identifier: 10.1039/d1cp00065a

ISSN: 1463-9076