Development of main chain scission type photoresists for EUV lithography

Summary

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Authors: Akihide Shirotori, Yannick Vesters, Manabu Hoshino, Ashish Rathore, Danilo De Simone, Geert Vandenberghe, Hirokazu Matsumoto

Journal title: International Conference on Extreme Ultraviolet Lithography 2019

Journal publisher: SPIE

Published year: 2019

Published pages: 17

DOI identifier: 10.1117/12.2536348

ISBN: 9781510629981