Unraveling the role of photons and electrons upon their chemical interaction with photoresist during EUV exposure

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Authors: Yannick Vesters, Atish Rathore, Pieter Vanelderen, John Petersen, Danilo De Simone, Geert Vandenberghe, Ivan Pollentier

Journal title: Advances in Patterning Materials and Processes XXXV

Journal publisher: SPIE

Published year: 2018

Published pages: 11

DOI identifier: 10.1117/12.2299593

ISBN: 9781-510616653