Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers

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Authors: Olivier Lugier, Alessandro Troglia, Najmeh Sadegh, Luc van Kessel, Roland Bliem, Nicola Mahne, Stefano Nannarone, Sonia Castellanos

Journal title: Journal of Photopolymer Science and Technology

Journal number: 33/2

Journal publisher: Technical Association of Photopolymers

Published year: 2020

Published pages: 229-234

DOI identifier: 10.2494/photopolymer.33.229

ISSN: 0914-9244