Nanoscale Ruthenium-Containing Deposits from Ru(CO)4I2 via Simultaneous Focused Electron Beam-Induced Deposition and Etching in Ultrahigh Vacuum: Mask Repair in Extreme Ultraviolet Lithography and Beyond,

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Authors: E. Bilgilisoy, J. C. Yu, C. Preischl, L. McElwee-White, H.P. Steinrück, H. Marbach

Journal title: ACS Applied Nano Mater

Journal number: 5

Journal publisher: American Chemical Society

Published year: 2022

Published pages: 3855-3865

DOI identifier: 10.1021/acsanm.1c04481

ISSN: 2574-0970