Dissociative ionization and electron beam induced deposition of tetrakis(dimethylamino)silane, a precursor for silicon nitride deposition

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Authors: Po-Yuan Shih, Reza Tafrishi, Maicol Cipriani, Christian Felix Hermanns, Jens Oster, Armin Gölzhäuser, Klaus Edinger and Oddur Ingólfsson

Journal title: PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Journal number: 16 (24)

Journal publisher: Royal Society of Chemistry

Published year: 2022

Published pages: 9564-9575

DOI identifier: 10.1039/d2cp00257d

ISSN: 1463-9076