How Ligands Affect Resistive Switching in Solution-Processed HfO 2 Nanoparticle Assemblies

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Authors: Jiaying Wang, Satyan Choudhary, Jonathan De Roo, Katrien De Keukeleere, Isabel Van Driessche, Alfred J. Crosby, Stephen S. Nonnenmann

Journal title: ACS Applied Materials & Interfaces

Journal number: 10/5

Journal publisher: American Chemical Society

Published year: 2018

Published pages: 4824-4830

DOI identifier: 10.1021/acsami.7b17376

ISSN: 1944-8244