Low peak power deposition regime in HiPIMS: Deposition of hard and dense nanocomposite Ti-Si-N films by DOMS without the need of energetic bombardment

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Authors: F. Fernandes, S. Calderon V., P.J. Ferreira, A. Cavaleiro, J.C. Oliveira

Journal title: Surface and Coatings Technology

Journal number: 397

Journal publisher: Elsevier BV

Published year: 2020

Published pages: 125996

DOI identifier: 10.1016/j.surfcoat.2020.125996

ISSN: 0257-8972