Modeling of silicon in femtosecond laser-induced modification regimes: accounting for ambipolar diffusion

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: Thibault J.-Y. Derrien, Nadezhda M. Bulgakova

Journal title: Nonlinear Optics and Applications X

Journal number: 10228

Journal publisher: SPIE

Published year: 2017

Published pages: 102280E

DOI identifier: 10.1117/12.2265671

ISBN: 978-1-5106-0958-7