Improving the Resolution in Mask-Aligner Lithography

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Authors: Andreas Vetter, Raoul Kirner, Toralf Scharf, Wilfried Noell, Carsten Rockstuhl, Reinhard Voelkel

Journal title: 2018 International Conference on Optical MEMS and Nanophotonics (OMN)

Journal publisher: IEEE

Published year: 2018

Published pages: 1-5

DOI identifier: 10.1109/omn.2018.8454655

ISBN: 978-1-5090-6374-1