Printing sub-micron structures using Talbot mask-aligner lithography with a 193 nm CW laser light source

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Authors: Andreas Vetter, Raoul Kirner, Dmitrijs Opalevs, Matthias Scholz, Patrick Leisching, Toralf Scharf, Wilfried Noell, Carsten Rockstuhl, Reinhard Voelkel

Journal title: Optics Express

Journal number: 26/17

Journal publisher: Optical Society of America

Published year: 2018

Published pages: 22218

DOI identifier: 10.1364/oe.26.022218

ISSN: 1094-4087