Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses

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Authors: Benedikt Rösner, Frieder Koch, Florian Döring, Jeroen Bosgra, Vitaliy A. Guzenko, Eugenie Kirk, Markus Meyer, Joshua L. Ornelas, Rainer H. Fink, Stefan Stanescu, Sufal Swaraj, Rachid Belkhou, Benjamin Watts, Jörg Raabe, Christian David

Journal title: Microelectronic Engineering

Journal number: 191

Journal publisher: Elsevier BV

Published year: 2018

Published pages: 91-96

DOI identifier: 10.1016/j.mee.2018.01.033

ISSN: 0167-9317