Contrast matching of line gratings obtained with NXE3XXX and EUV- interference lithography

Summary

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Authors: Zuhal Tasdemir, Yasin Ekinci, Roberto Fallica, Iacopo Mochi, Karen Garrido Olvera, Marieke Meeuwissen, Oktay Yildirim, Rolf Custers, Rik Hoefnagels, Gijsbert Rispens, Michaela Vockenhuber

Journal title: International Conference on Extreme Ultraviolet Lithography 2017

Journal publisher: SPIE

Published year: 2017

Published pages: 65

DOI identifier: 10.1117/12.2280541

ISBN: 9781-510613751