State-of-the-art EUV materials and processes for the 7nm node and beyond

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Authors: Elizabeth Buitrago, Marieke Meeuwissen, Oktay Yildirim, Rolf Custers, Rik Hoefnagels, Gijsbert Rispens, Michaela Vockenhuber, Iacopo Mochi, Roberto Fallica, Zuhal Tasdemir, Yasin Ekinci

Journal title: Extreme Ultraviolet (EUV) Lithography VIII

Journal publisher: SPIE

Published year: 2017

Published pages: 101430T

DOI identifier: 10.1117/12.2260153