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Authors: Iacopo Mochi, Karen Garrido Olvera, Marieke Meeuwissen, Oktay Yildirim, Rolf Custers, Rik Hoefnagels, Gijsbert Rispens, Michaela Vockenhuber, Yasin Ekinci, Zuhal Tasdemir
Journal title: Extreme Ultraviolet (EUV) Lithography IX
Journal publisher: SPIE
Published year: 2018
Published pages: 66
DOI identifier: 10.1117/12.2299643
ISBN: 9781-510616592
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