Dark-field electron holography as a recording of crystal diffraction in real space: a comparative study with high-resolution X-ray diffraction for strain analysis of MOSFETs

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: V. Boureau, A. Durand, P. Gergaud, D. Le Cunff, M. Wormington, D. Rouchon, A. Claverie, D. Benoit and M. Hÿtch

Journal title: Journal of Applied Crystallography

Journal publisher: Journal of Applied Crystallography

Published year: 2020

DOI identifier: 10.1107/s1600576720006020

ISSN: 1600-5767