A sensitive EUV Schwarzschild microscope for plasma studies with sub-micrometer resolution

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Authors: U. Zastrau, C. Rödel, M. Nakatsutsumi, T. Feigl, K. Appel, B. Chen, T. Döppner, T. Fennel, T. Fiedler, L. B. Fletcher, E. Förster, E. Gamboa, D. O. Gericke, S. Göde, C. Grote-Fortmann, V. Hilbert, L. Kazak, T. Laarmann, H. J. Lee, P. Mabey, F. Martinez, K.-H. Meiwes-Broer, H. Pauer, M. Perske, A. Przystawik, S. Roling, S. Skruszewicz, M. Shihab, J. Tiggesbäumker, S. Toleikis, M. Wünsche, H.

Journal title: Review of Scientific Instruments

Journal number: 89/2

Journal publisher: American Institute of Physics

Published year: 2018

Published pages: 023703

DOI identifier: 10.1063/1.5007950

ISSN: 0034-6748