Electron beam lithography and dimensional metrology for fin and nanowire devices on Ge, SiGe and GeOI substrates,

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Authors: Nikolay Petkov, Margarita Georgieva, Sinan Bugu, Ray Duffy, Brendan McCarthy, Maksym Myronov, Ann-Marie Kelleher, Graeme Maxwell, Giorgos Fagas

Journal title: Microelectronic Engineering

Journal number: Volume 280, 2023, 112071

Journal publisher: Elsevier BV

Published year: 2023

DOI identifier: 10.1016/j.mee.2023.112071

ISSN: 0167-9317