Low-temperature ALD of highly conductive antimony films through the reaction of silylamide with alkoxide and alkylamide precursors

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Authors: He, S., Bahrami, A., Zhang, X., Julin, J., Laitinen, M., & Nielsch, K.

Journal title: Materials Today Chemistry

Journal number: 32

Journal publisher: Elsevier BV

Published year: 2023

Published pages: 101650

DOI identifier: 10.1016/j.mtchem.2023.101650

ISSN: 2468-5194