Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

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Authors: Lianjia Wu, Martijn Tiekink, Alexandre Giuliani, Laurent Nahon, Sonia Castellanos

Journal title: Journal of Materials Chemistry C

Journal number: 7/1

Journal publisher: Royal Society of Chemistry

Published year: 2019

Published pages: 33-37

DOI identifier: 10.1039/C8TC05273E

ISSN: 2050-7534