Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers

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Authors: Bence Horváth, Pál Ormos and Lóránd Kelemen

Journal title: Micromachines

Journal number: 8/7

Journal publisher: Multidisciplinary Digital Publishing Institute (MDPI)

Published year: 2017

Published pages: 219

DOI identifier: 10.3390/mi8070219

ISSN: 2072-666X