Actinic inspection of the EUV optical parameters of lithographic materials with lab-based radiometry and reflectometry

Summary

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Authors: Kevin M. Dorney, Nicola N. Kissoon, Fabian Holzmeier, Esben W. Larsen, Dhirendra P. Singh, Shikhar Arvind, Sayantani Santra, Roberto Fallica, Igor Makhotkin, Vicky Philipsen, Stefan De Gendt, Claudia Fleischmann, Paul A. W. van der Heide, John S. Petersen

Journal title: Proceedings of SPIE, Volume 12494, Optical and EUV Nanolithography XXXVI

Journal number: 12494, 2023

Journal publisher: SPIE

Published year: 2023

Published pages: 1249407

DOI identifier: 10.1117/12.2658359