Interlayer Coupling Limit in Artificially Stacked MoS<sub>2</sub> Homojunctions

Summary

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: Juan C. Arias‐Muñoz; Henri Kaaripuro; Yi Zhang; Susobhan Das; Henry A. Fernandez; Zhipei Sun

Journal title: Advanced Functional Materials

Journal number: 1

Journal publisher: John Wiley & Sons Ltd.

Published year: 2023

DOI identifier: 10.1002/adfm.202310365

ISSN: 1616-301X