Spatially selective crystallization of ferroelectric Hf0.5Zr0.5O2 films induced by sub-nanosecond laser annealing

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Authors: Frechilla, Alejandro; Napari, Mari; Strkalj, Nives; Barriuso, Eduardo; Niang, Kham; Hellenbrand, Markus; Strichovanec, Pavel; Simanjuntak, Firman Mangasa; Antorrena, Guillermo; Flewitt, Andrew; Magén, César; de la Fuente, Germán F.; MacManus-Driscoll, Judith L.; Angurel, Luis Alberto; Pardo, José Ángel

Journal title: Applied Materials Today

Journal number: 4

Journal publisher: Elsevier

Published year: 2024

DOI identifier: 10.1016/j.apmt.2023.102033

ISSN: 2352-9415