Impact of flows, temperature and pressure on the GeSn growth kinetics with a digermane and tin tetrachloride chemistry

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Authors: J.M. Hartmann, T. Marion

Journal title: Materials Science in Semiconductor Processing

Journal number: 169

Journal publisher: Elsevier BV

Published year: 2023

DOI identifier: 10.1016/j.mssp.2023.107893

ISSN: 1369-8001