Characterization of process-related interfacial dielectric loss in aluminum-on-silicon by resonator microwave measurements, materials analysis, and imaging

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Authors: Lert Chayanun, Janka Biznárová, Lunjie Zeng, Per Malmberg, Andreas Nylander, Amr Osman, Marcus Rommel, Pui Lam Tam, Eva Olsson, Per Delsing, August Yurgens, Jonas Bylander, Anita Fadavi Roudsari

Journal title: APL Quantum

Journal number: 1

Journal publisher: AIP Publishing

Published year: 2024

DOI identifier: 10.1063/5.0208140

ISSN: 2835-0103