Lifting the Concentration Limit of Mass Photometry by PEG Nanopatterning

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Authors: Jiří Kratochvíl, Roi Asor, Seham Helmi, Weston B. Struwe, Philipp Kukura

Journal title: Nano Letters

Journal number: 24

Journal publisher: American Chemical Society

Published year: 2024

Published pages: 10032-10039

DOI identifier: 10.1021/acs.nanolett.4c01667

ISSN: 1530-6984