Stitching insights towards high numerical aperture extreme ultraviolet lithography: an experimental study

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Authors: Vincent Wiaux, Natalia Davydova, Lieve Van Look, Nick Pellens, Ataklti Weldeslassie, Guillaume Libeert, Tatiana Kovalevich, Joost Bekaert, Frank Timmermans, Cyrus Tabery, Laura Huddleston

Journal title: Journal of Micro/Nanopatterning, Materials, and Metrology

Journal number: 24

Journal publisher: SPIE

Published year: 2025

DOI identifier: 10.1117/1.jmm.24.1.011012

ISSN: 2708-8340