Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography

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Authors: Scott M. Lewis, Hayden R. Alty, Michaela Vockenhuber, Guy A. DeRose, Antonio Fernandez-Mato, Dimitrios Kazazis, Paul L. Winpenny, Richard Grindell, Grigore A. Timco, Axel Scherer, Yasin Ekinci, Richard E. P. Winpenny

Journal title: Journal of Micro/Nanopatterning, Materials, and Metrology

Journal number: 21

Journal publisher: IEEE

Published year: 2024

DOI identifier: 10.1117/1.jmm.21.4.041404

ISSN: 2708-8340