Negative Tone Metallic Organic Resists with Improved Sensitivity for Plasma Etching: Implications for Silicon Nanostructure Fabrication and Photomask Production

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Authors: Ahmad Chaker, Hayden A. Alty, Paul Winpenny, George F. S. Whitehead, Grigore A. Timco, Scott M. Lewis, Richard E. P. Winpenny

Journal title: ACS Applied Nano Materials

Journal number: 5

Journal publisher: American Chemical Society

Published year: 2023

Published pages: 17538-17543

DOI identifier: 10.1021/acsanm.2c02986

ISSN: 2574-0970