Atomic layer deposition of vanadium oxides: process and application review

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Authors: V.P. Prasadam, N. Bahlawane, F. Mattelaer, G. Rampelberg, C. Detavernier, L. Fang, Y. Jiang, K. Martens, I.P. Parkin, I. Papakonstantinou

Journal title: Materials Today Chemistry

Journal number: 12

Journal publisher: Elsevier

Published year: 2019

Published pages: 396-423

DOI identifier: 10.1016/j.mtchem.2019.03.004

ISSN: 2468-5194