Mechanism of oxygen reduction <i>via</i> chemical affinity in NiO/SiO₂ interfaces irradiated with keV energy hydrogen and helium ions for heterostructure fabrication

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Authors: Mario Mery, Claudio Gonzalez-Fuentes, Igor Stanković, Jorge M. Nuñez, Jorge E. Valdés, Myriam H. Aguirre, Carlos García

Journal title: Nanoscale Horizons

Journal number: 10

Journal publisher: ROYAL SOCIETY OF CHEMISTRY

Published year: 2025

Published pages: 568-575

DOI identifier: 10.1039/d4nh00460d

ISSN: 2055-6756