Defect analysis in low temperature atomic layer deposited Al 2 O 3 and physical vapor deposited SiO barrier films and combination of both to achieve high quality moisture barriers

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Authors: Tony Maindron, Tony Jullien, Agathe André

Journal title: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Journal number: 34/3

Journal publisher: American Institute of Physics

Published year: 2016

Published pages: 031513

DOI identifier: 10.1116/1.4947289

ISSN: 0734-2101