Intentional Incorporation and Tailoring of Point Defects during Sublimation Growth of Cubic Silicon Carbide by Variation of Process Parameters

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Authors: Michael Schöler, Maximilian W. Lederer, Philipp Schuh, Peter J. Wellmann

Journal title: physica status solidi (b)

Journal number: 257/1

Journal publisher: John Wiley & Sons Ltd.

Published year: 2019

Published pages: 1900286

DOI identifier: 10.1002/pssb.201900286

ISSN: 0370-1972