Computer modeling of single-layer nanocluster formation in a thin SiO 2 layer buried in Si by ion mixing and thermal phase decomposition

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Authors: Thomas Prüfer, Wolfhard Möller, Karl-Heinz Heinig, Daniel Wolf, Hans-Jürgen Engelmann, Xiaomo Xu, Johannes von Borany

Journal title: Journal of Applied Physics

Journal number: 125/22

Journal publisher: American Institute of Physics

Published year: 2019

Published pages: 225708

DOI identifier: 10.1063/1.5096451

ISSN: 0021-8979