Machine Learning Prediction of Defect Formation Energies in a-SiO 2

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Authors: Diego Milardovich, Markus Jech, Dominic Waldhoer, Michael Waltl, Tibor Grasser

Journal title: 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

Journal publisher: IEEE

Published year: 2020

Published pages: 339-342

DOI identifier: 10.23919/sispad49475.2020.9241609

ISBN: 978-4-86348-763-5