Investigation of recrystallization and stress relaxation in nanosecond laser annealed Si1−xGex/Si epilayers

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Authors: L. Dagault, S. Kerdilès, P. Acosta Alba, J.-M. Hartmann, J.-P. Barnes, P. Gergaud, E. Scheid, F. Cristiano

Journal title: Applied Surface Science

Journal number: 527

Journal publisher: Elsevier BV

Published year: 2020

Published pages: 146752

DOI identifier: 10.1016/j.apsusc.2020.146752

ISSN: 0169-4332