Investigation of oxygen penetration during UV nanosecond laser annealing of silicon at high energy densities

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Authors: R. Monflier, T. Tabata, H. Rizk, J. Roul, K. Huet, F. Mazzamuto, P. Acosta Alba, S. Kerdilès, S. Boninelli, A. La Magna, E. Scheid, F. Cristiano, E. Bedel-Pereira

Journal title: Applied Surface Science

Journal number: 546

Journal publisher: Elsevier BV

Published year: 2021

Published pages: 149071

DOI identifier: 10.1016/j.apsusc.2021.149071

ISSN: 0169-4332