ERD

Set-up of an Industrial advisory board

Project: 2D-EPL

Updated at: 10-05-2024

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Project acronym 2D-EPL

Dissemination and communication plan

Project: 2D-EPL

Updated at: 10-05-2024

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Project acronym 2D-EPL

Compare wafer scale single crystalline to polycrystalline

Project: 2D-EPL

Updated at: 10-05-2024

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Project acronym 2D-EPL

Evaluation and adaptation of access policy and procedures

Project: 2D-EPL

Updated at: 10-05-2024

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Project acronym 2D-EPL

Fact sheet for the MPW runs

Project: 2D-EPL

Updated at: 10-05-2024

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Project acronym 2D-EPL

Protocol for characterisation

Project: 2D-EPL

Updated at: 10-05-2024

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Project acronym 2D-EPL

Report on received requests year 1

Project: 2D-EPL

Updated at: 10-05-2024

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Project acronym 2D-EPL

Report on received requests year 2

Project: 2D-EPL

Updated at: 10-05-2024

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Project acronym 2D-EPL

Single entry-point web portal

Project: 2D-EPL

Updated at: 10-05-2024

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Project acronym 2D-EPL

Transparent cost structure

Project: 2D-EPL

Updated at: 10-05-2024

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Project acronym 2D-EPL

How to report and benchmark emerging field-effect transistors

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Superior electrostatic control in uniform monolayer MoS2 scaled transistors via in-situ surface smoothening

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

2D materials for future heterogeneous electronics

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Large-area integration of two-dimensional materials and their heterostructures by wafer bonding

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Graphene in 2D/3D Heterostructure Diodes for High Performance Electronics and Optoelectronics

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Stable Al2O3 Encapsulation of MoS2-FETs Enabled by CVD Grown h-BN

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

AFM-Based Hamaker Constant Determination with Blind Tip Reconstruction

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Scaling of double-gated WS2 FETs to sub-5nm physical gate length fabricated in a 300mm FAB

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Wafer scale integration of MX2 based NMOS only ring oscillators on 300 mm wafers

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Periodic Reporting for period 1 - 2D-EPL (Graphene Flagship 2D Experimental Pilot Line)

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

High yield and process uniformity for 300 mm integrated WS2 FETs

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Zero-Bias Power-Detector Circuits based on MoS2 Field-Effect Transistors on Wafer-Scale Flexible Substrates

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Plasma enhanced atomic layer etching of high-k layers on WS2

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Graphene-Based Microwave Circuits: A Review

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Reliable metal–graphene contact formation process flows in a CMOS-compatible environment

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Plasma‐Enhanced Atomic Layer Deposition of Al 2 O 3 on Graphene Using Monolayer hBN as Interfacial Layer

Project: 2D-EPL

Updated at: 27-04-2024

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Project acronym 2D-EPL

Resources

Selected filters:

Set-up of an Industrial advisory board

Dissemination and communication plan

Compare wafer scale single crystalline to polycrystalline

Evaluation and adaptation of access policy and procedures

Fact sheet for the MPW runs

Protocol for characterisation

Report on received requests year 1

Report on received requests year 2

Single entry-point web portal

Transparent cost structure

How to report and benchmark emerging field-effect transistors

Superior electrostatic control in uniform monolayer MoS2 scaled transistors via in-situ surface smoothening

2D materials for future heterogeneous electronics

Large-area integration of two-dimensional materials and their heterostructures by wafer bonding

Graphene in 2D/3D Heterostructure Diodes for High Performance Electronics and Optoelectronics

Stable Al2O3 Encapsulation of MoS2-FETs Enabled by CVD Grown h-BN

AFM-Based Hamaker Constant Determination with Blind Tip Reconstruction

Scaling of double-gated WS2 FETs to sub-5nm physical gate length fabricated in a 300mm FAB

Wafer scale integration of MX2 based NMOS only ring oscillators on 300 mm wafers

Periodic Reporting for period 1 - 2D-EPL (Graphene Flagship 2D Experimental Pilot Line)

High yield and process uniformity for 300 mm integrated WS2 FETs

Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

Zero-Bias Power-Detector Circuits based on MoS2 Field-Effect Transistors on Wafer-Scale Flexible Substrates

Plasma enhanced atomic layer etching of high-k layers on WS2

Graphene-Based Microwave Circuits: A Review

Reliable metal–graphene contact formation process flows in a CMOS-compatible environment

Plasma‐Enhanced Atomic Layer Deposition of Al 2 O 3 on Graphene Using Monolayer hBN as Interfacial Layer