Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO 2 Using Trivinylmethoxysilane and Oxygen Plasma

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Authors: Viet Huong Nguyen, Abderrahime Sekkat, César Arturo Masse de la Huerta, Fadi Zoubian, Chiara Crivello, Juan Rubio-Zuazo, Moustapha Jaffal, Marceline Bonvalot, Christophe Vallée, Olivier Aubry, Hervé Rabat, Dunpin Hong, David Muñoz-Rojas

Journal title: Chemistry of Materials

Journal number: 32/12

Journal publisher: American Chemical Society

Published year: 2020

Published pages: 5153-5161

DOI identifier: 10.1021/acs.chemmater.0c01148

ISSN: 0897-4756