In‐Flow MOF Lithography

Summary

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Authors: Semih Sevim, Carlos Franco, Hongjun Liu, Hervé Roussel, Laetitia Rapenne, Juan Rubio‐Zuazo, Xiang‐Zhong Chen, Salvador Pané, David Muñoz‐Rojas, Andrew J. deMello, Josep Puigmartí‐Luis

Journal title: Advanced Materials Technologies

Journal number: 4/6

Journal publisher: WILEY-VCH Verlag GmbH & Co

Published year: 2019

Published pages: 1800666

DOI identifier: 10.1002/admt.201800666

ISSN: 2365-709X