Process informed accurate compact modelling of 14-nm FinFET variability and application to statistical 6T-SRAM simulations

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Authors: Xingsheng Wang, Dave Reid, Liping Wang, Campbell Millar, Alexander Burenkov, Peter Evanschitzky, Eberhard Baer, Juergen Lorenz, Asen Asenov

Journal title: 2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)

Journal publisher: IEEE

Published year: 2016

Published pages: 303-306

DOI identifier: 10.1109/SISPAD.2016.7605207

ISBN: 978-1-5090-0818-6