Overlay accuracy limitations of soft stamp UV nanoimprint lithography and circumvention strategies for device applications

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Authors: P.J. Cegielski, J. Bolten, J.W. Kim, F. Schlachter, C. Nowak, T. Wahlbrink, A.L. Giesecke, M.C. Lemme

Journal title: Microelectronic Engineering

Journal number: 197

Journal publisher: Elsevier BV

Published year: 2018

Published pages: 83-86

DOI identifier: 10.1016/j.mee.2018.06.004

ISSN: 0167-9317