Interlayer Coupling Limit in Artificially Stacked MoS₂ Homojunctions

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Authors: Juan C. Arias‐Muñoz, Henri Kaaripuro, Yi Zhang, Susobhan Das, Henry A. Fernandez, Zhipei Sun

Journal title: Advanced Functional Materials

Journal number: 34

Journal publisher: John Wiley & Sons Ltd.

Published year: 2024

DOI identifier: 10.1002/adfm.202310365

ISSN: 1616-301X